Effects of nitrogen addition on the properties of a-SiCN:H films using hexamethyldisilazane

被引：0

作者：

Limmanee, Amornrat ^{[1
]}

Otsubo, Michio ^{[1
]}

Sugiura, Tsutomu ^{[1
]}

Sato, Takehiko ^{[2
]}

Miyajima, Shinsuke ^{[1
]}

Yamada, Akira ^{[3
]}

Konagai, Makoto ^{[1
]}

机构：

[1] Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, 2-12-1-S9-9 O Okayama, Tokyo 1528552, Japan

[2] Mitsubishi Electr Corp, Mat & Proc Technol, Sagamihara, Kanagawa 2291195, Japan

[3] Tokyo Inst Technol, Quantum Nanoelect Res Ctr, Meguro Ku, Tokyo 1528552, Japan

来源：

AMORPHOUS AND POLYCRYSTALLINE THIN-FILM SILICON SCIENCE AND TECHNOLOGY 2007 | 2007年 / 989卷

关键词：

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We deposited a -SiCN:H films by HWCVD using a gas mixture of hexamethyldisilazane (HMDS), H-2 and N-2, and fabricated cast polycrystalline silicon (poly c-Si) solar cells with the a-SiCN:H passivation and anti-reflection layer. N-2 addition led to the reduction of the refractive index (n) of the a-SiCN:H films due to the increase in nitrogen concentration of the films. This improved performance of the antireflection layer. The advantage of adding N-2 to the process was demonstrated by the improvement in short circuit current (J(SC)) and efficiency (eta) of cast poly c-Si silicon solar cells.

引用

页码：49 / +

页数：2

共 50 条

[41] Controlling of Chemical Bonding Structure, Wettability, Optical Characteristics of SiCN:H (SiC:H) Films Produced by PECVD Using Tetramethylsilane and Ammonia Mixture [J].

Ermakova, Evgeniya ;

Kolodin, Alexey ;

Fedorenko, Anastasiya ;

Yushina, Irina ;

Shayapov, Vladimir ;

Maksimovskiy, Eugene ;

Kosinova, Marina .

COATINGS, 2023, 13 (02)

[42] Effect of nitrogen addition on morphology and magnetic properties of electrodeposited Co-Ni granular films [J].

Sirbu, C. ;

Georgescu, V. .

JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2008, 10 (09) :2396-2401

[43] Effect of nitrogen on the microstructure and the luminescence properties of a-C:H thin films [J].

Northeast Normal Univ, Changchun, China .

Solid State Commun, 8 (597-602)

[44] The effect of nitrogen on the microstructure and the luminescence properties of a-C:H thin films [J].

Liu, YC ;

Demichelis, F ;

Tagliaferro, A .

SOLID STATE COMMUNICATIONS, 1996, 100 (08) :597-602

[45] The Effects of Nitrogen Content on the Mechanical and Tribological Properties of CrTaWNx Thin Films [J].

Chang, Li-Chun ;

Wang, Li-Zhu ;

Chen, Yung-, I .

COATINGS, 2024, 14 (08)

[46] Effects of nitrogen incorporation on structural properties of fluorinated amorphous carbon films [J].

Yokomichi, H ;

Masuda, A .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 2000, 271 (1-2) :147-151

[47] Effects of nitrogen on the structure and properties of highly tetrahedral amorphous carbon films [J].

Wei, AX ;

Chen, DH ;

Ke, N ;

Cheung, WY ;

Peng, SQ ;

Wong, SP .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1998, 31 (13) :1522-1526

[48] Effects of Nitrogen Flow Rate on the Properties of Indium Oxide Thin Films [J].

Cho, Shinho ;

Kim, Moonhwan .

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2013, 13 (11) :7788-7792

[49] Effects of nitrogen doping on optical properties of tungsten oxide thin films [J].

Sun, Xilian ;

Cao, Hongtao .

SUSTAINABLE DEVELOPMENT OF NATURAL RESOURCES, PTS 1-3, 2013, 616-618 :1773-1777

[50] Nitrogen effects on structure, mechanical and thermal fracture properties of CrN films [J].

He, Youxing ;

Gao, Kewei ;

Yang, Huisheng ;

Pang, Xiaolu ;

Volinsky, Alex A. .

CERAMICS INTERNATIONAL, 2021, 47 (21) :30729-30740

← 1 2 3 4 5 →