Uncertainty evaluation of a 300-mm-aperture vertical Fizeau interferometer

被引:0
作者
Wang, Yuntao [1 ]
Chen, Lei [1 ]
Hu, Chenhui [1 ]
Zheng, Donghui [1 ]
Huang, Chen [1 ]
Ma, Zhiyao [1 ]
Ma, Haiying [1 ]
机构
[1] Nanjing Univ Sci & Technol, Sch Elect & Opt Engn, 200 Xiao Ling Wei, Nanjing 210094, Peoples R China
来源
OPTICAL MEASUREMENT SYSTEMS FOR INDUSTRIAL INSPECTION XII | 2021年 / 11782卷
关键词
Interferometer; uncertainty evaluation; interference cavity; three-flat method; CALIBRATION;
D O I
10.1117/12.2591870
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In the development of a high-precision vertical Fizeau interferometer with 300-mm aperture, uncertainty evaluation is a significant method to assess the accuracy of interferometer. In this paper, we reported an uncertainty evaluation method. Then, the uncertainty evaluation of a 300-mm-aperture vertical Fizeau interferometer was carried out based on the method. The uncertainties of interference cavity measurement and absolute testing (e.g., three-flat method) were used as indicators of uncertainty evaluation. In addition, the gravity-induced deformation of three-flat method can be compensated accurately by finite element method modeling. Finally, we obtained the uncertainties of interference cavity measurement and three-flat method. With 300-mm aperture, the expanded uncertainty of interference cavity measurement is 3.7 x 10(-3) lambda and the expanded uncertainty of three-flat method is 1.47 x 10(-)(2) lambda.
引用
收藏
页数:9
相关论文
共 17 条
[1]  
[Anonymous], 1993, GUID EXPR UNC MEAS G
[2]  
[Anonymous], 2008, JCGM, V101, P2008
[3]   Simple uncertainty evaluation method for an interferometric flatness measurement machine using a calibrated test flat [J].
Bitou, Youichi ;
Takatsuji, Toshiyuki ;
Ehara, Kensei .
METROLOGIA, 2008, 45 (01) :21-26
[4]  
Burke J., 2012, P SOC PHOTO-OPT INS, V8493
[5]  
Burke J., 2005, P ASPE, P31
[6]  
Evans Chris J., 2013, International Journal of Precision Technology, V3, P388, DOI 10.1504/IJPTECH.2013.058259
[7]   Certification, self-calibration and uncertainty in testing optical flats [J].
Evans, Chris J. .
5TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTICAL TEST AND MEASUREMENT TECHNOLOGY AND EQUIPMENT, 2010, 7656
[8]  
International Organization for Standarization, 1995, GUID EXPR UNC MEAS G
[9]  
Joint Committee for Guides in Metrology, 2008, JCGM 100:2008, V100, P1, DOI DOI 10.1373/CLINCHEM.2003.030528
[10]  
Kondo Yohan, 2015, Key Engineering Materials, V625, P310, DOI 10.4028/www.scientific.net/KEM.625.310