Initial adsorption structure of ethylene on Si(001) surface at room temperature

被引:15
作者
Seo, JH
Park, JY
Whang, CN [1 ]
Kim, SS
Choi, DS
Chae, KH
机构
[1] Yonsei Univ, Inst Phys & Appl Phys, Atom Scale Surface Sci Res Ctr, Seoul 120749, South Korea
[2] Mokwon Univ, Dept Tech Marketing, Taejon 301729, South Korea
[3] Kangwon Natl Univ, Dept Phys, Chunchon 200701, South Korea
[4] Korea Inst Sci & Technol, Mat Sci & Technol Div, Seoul 130791, South Korea
基金
新加坡国家研究基金会;
关键词
initial adsorption; surface structure; silicon; ethylene; low energy ion scattering (LEIS);
D O I
10.1016/j.susc.2005.03.006
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Ethylene (C2H4) on the Si(001) surface has been a Subject of numerous investigations over a decade. Despite a wealth of experimental and theoretical studies, the adsorption structures are not clearly understood yet. In order to elucidate this controversial issues clearly, C2H4 molecules have been non-dissociatively chemisorbed on Si(001)-(2 x 1) surface at room temperature with an exposure of 100 L, and C2H4 on Si(001) surface structure has been investigated by coaxial impact collision ion scattering spectroscopy (CAICISS). To determine the adsorption structure of the C2H4 molecules definitely, the computer simulation with the two-dimensional trajectory counting method has been performed for the recently proposed most possible two single molecular adsorption configurations (di-sigma on-top and di-sigma end-bridge). The CAICISS spectra show a better agreement with the simulation results for the di-sigma on-top structure than that for the di-sigma end-bridge structure. The bond length of Si dimer separation on the Si(001) surface with the adsorption of 100 L C2H4 is found to be 2.35 +/- 0.05 angstrom. This implies that the bonding of Si dimers stays intact. It is also found that the bonding length of C-Si and C-C is 1.81 +/- 0.05 angstrom and 1.61 +/- 0.05 angstrom respectively. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:L129 / L134
页数:6
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