Nanoscale interwoven structure of B2 and R-phase in Ni-Ti alloy film

被引：5

作者：

Zhao, Chunwang ^{[1
,2
]}

Zhao, Shilei ^{[2
]}

Jin, Yongjun ^{[2
]}

Meng, Xiaokai ^{[2
]}

机构：

[1] Shanghai Maritime Univ, Coll Arts & Sci, Shanghai 207306, Peoples R China

[2] Inner Mongolia Univ Technol, Coll Sci, Hohhot 010051, Peoples R China

来源：

VACUUM | 2016年 / 129卷

基金：

中国国家自然科学基金;

关键词：

Ni-Ti; R-phase; Sputtering; Thin film; Transmission electron microscopy; SHAPE-MEMORY ALLOYS; MARTENSITIC-TRANSFORMATION; DISPLACEMENT;

D O I：

10.1016/j.vacuum.2016.04.015

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ti-50.3Ni (at%) alloy film was prepared by vacuum magnetron sputtering, followed by heat treatment at 460 degrees C for 40 min. The microstructure of the Ni-Ti alloy film was studied using transmission electron microscopy. A nanoscale interwoven structure of B2 and R-phase was observed. The lattice correspondences between B2 and R-phase were analyzed using an electron diffraction pattern. The R-phase can nucleate in the precipitate-free area of the Ni-Ti alloy film at a rapid cooling condition. The full-field strain of B2 and R-phase was mapped through geometric phase analysis technique. The measured strains are consistent with the eigenstrains of the R-phase. (C) 2016 Elsevier Ltd. All rights reserved.

引用

页码：45 / 48

页数：4

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