Crystallinity of titania thin films deposited by light induced chemical vapor deposition

Titanium dioxide thin films were deposited from titanium tetraisopropoxide in an oxygen atmosphere by light induced chemical vapor deposition (LICVD), using a 308 nm XeCl excimer laser We report on the influence of substrate holder temperature at a low fluence (150 mJ/cm(2)) on the deposition on glass substrates. The growth rate follows an Arrhenius behavior between 120 and 210 degreesC, corresponding to an activation energy of the deposition reaction of 20 kJ/mol. XRD and Raman spectroscopy detected a mixture of anatase and rutile crystals, possibly in an amorphous material. With increasing substrate temperature, the crystallinity is enhanced and the ratio, anatase/rutile increases. (C) 2000 published by Elsevier Science B.V.