Effect of film thickness on interface and electric properties of BiFeO3 thin films

被引:60
作者
Lee, Chia-Ching [1 ]
Wu, Jenn-Ming [1 ]
机构
[1] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan
关键词
thin film; ferroelectric; film thickness; bismuth ferrite;
D O I
10.1016/j.apsusc.2007.02.060
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Bismuth ferrite (BFO) thin films were fabricated by R-F-magnetron sputtering deposition method on Pt/Ti/SiO2/Si(1 0 0) substrate. The effect of the thickness of BFO films varying from 85 to 2,80 nm on electrical properties was investigated. Saturated coercive fields were found to increase with the BFO film thickness. The dielectric constant of BFO thin films measured at I kHz decreased with decreasing thickness from 98 to 86, while tangent losses increased from 0.013 to 0.02 1. The presence of bismuth oxide at the interface between BFO films and Pt bottom electrodes was responsible for the high leakage currents in thin BFO thin films as was demonstrated by X-ray diffraction, grazing-incident X-ray diffraction, and secondary ion mass spectroscopy analysis. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:7069 / 7073
页数:5
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