Ellipsometric Expressions for a Near-normal-incidence Ellipsometer with the Polarizer-compensator-sample-compensator-analyzer Configuration

被引:0
|
作者
Kim, Sang Youl [1 ]
机构
[1] Ellipso Technol Co Ltd, Suwon 16498, South Korea
关键词
High aspect ratio; Near-nonnal-incidence ellipsometer; Optical critical dimension; Rotating compensator ellipsometer; MUELLER-MATRIX;
D O I
10.3807/KJOP.2021.32.4.172
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A near-normal-incidence ellipsometer (NNIE) is suggested as an optical critical dimension (OCD) measurement system that is highly sensitive to the bottom defect of a sample with high-aspect-ratio structured patterns. Incident light passes through a polarizer and a phase retarder in sequence, and the reflected light from the sample also passes through them, but in reverse order. The operating principle of this NNIE, where a single polarizer and a single phase retarder are shared by the incident and reflected light, is studied, and a method to determine the ellipsometric constants from the measured intensities at proper combinations of the azimuthal angles of polarizer and retarder is presented.
引用
收藏
页码:172 / 179
页数:8
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