Laplace-transform deep-level transient spectroscopy studies of the G4 gold-hydrogen complex in silicon

被引:28
作者
Deixler, P [1 ]
Terry, J
Hawkins, ID
Evans-Freeman, JH
Peaker, AR
Rubaldo, L
Maude, DK
Portal, JC
Dobaczewski, L
Nielsen, KB
Larsen, AN
Mesli, A
机构
[1] Univ Manchester, Inst Sci & Technol, Ctr Elect Mat, Manchester M60 1QD, Lancs, England
[2] MPI, CNRS, Lab Champs Magnet Intenses, F-38042 Grenoble, France
[3] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
[4] Aarhus Univ, Inst Phys & Astron, DK-8000 Aarhus C, Denmark
[5] Lab PHASE, CNRS, F-67037 Strasbourg, France
关键词
D O I
10.1063/1.122694
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have studied n-type silicon containing gold and gold-hydrogen complexes using high-resolution "Laplace'' deep-level transient spectroscopy. This technique has enabled two quite distinct electron emission rates to be observed at temperatures between 240 and 300 K. These are associated with the gold acceptor and the level referred to as G4, which is observed when hydrogen and gold are present in silicon. The gold acceptor has a measured activation energy for electron emission of 558+/-8 meV, and the G4 state of 542+/-8 meV. The directly measured electron capture cross section for G4 is determined to be 0.6+/-0.1 sigma(n(gold acceptor)) at 275 K from which it is inferred gold that the state is acceptor-like. (C) 1998 American Institute of Physics. [S0003-6951(98)01447-8].
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页码:3126 / 3128
页数:3
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