Diffraction Efficiency of Enhanced Phase Grating

被引:8
作者
Yang Guanghua [1 ,2 ]
Wang Yu [1 ,2 ]
Li Jing [1 ,2 ]
Qi Yuejing [1 ,2 ]
Ding Minxia [1 ]
机构
[1] Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
关键词
diffraction; phase grating; diffraction efficiency; position measurement system; NEXT-GENERATION;
D O I
10.3788/AOS202141.1205001
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In order to improve the measurement accuracy of a phase grating position measurement system, it is necessary to reduce the diffraction efficiency of diffraction signals of the zero order and even diffraction orders, and enhance the diffraction efficiency of high odd order diffraction signals. At present, the known diffraction efficiency model of enhanced phase gratings restricts the range of values of the structural parameters. A special high odd order diffraction signal is used as the optimized target in the design. Therefore, in order to design the phase grating structure with diffraction enhancement and zero and even order diffraction missing for multiple high odd order diffraction signals, the diffraction efficiency of the enhanced phase grating is deeply studied. In this work, based on the scalar diffraction theory, the theoretical models of the phase grating structure and diffraction efficiency are established; the influences of grating structure parameters such as groove depth, grating ridge width, and grating ridge position on diffraction efficiency are analyzed. According to the constraints of phase grating position measurement system, the enhanced grating structure with multiple odd diffraction orders is obtained. This kind of structure not only makes the zero and even order diffraction missing, but also improves the diffraction efficiency of the 5th, 7th, and 9th order diffraction. This study is helpful to understand the diffraction principle of the enhanced phase grating and provides support for grating design.
引用
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页数:12
相关论文
共 24 条
[1]   Overlay performance in advanced processes [J].
Bornebroek, F ;
Burghoorn, J ;
Greeneich, JS ;
Megens, HJ ;
Satriasaputra, D ;
Simons, G ;
Stalnaker, S ;
Koek, B .
OPTICAL MICROLITHOGRAPHY XIII, PTS 1 AND 2, 2000, 4000 :520-531
[2]   7/5 nm Logic Manufacturing Capabilities and Requirements of Metrology [J].
Bunday, Benjamin ;
Bello, A. F. ;
Solecky, Eric ;
Vaid, Alok .
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXII, 2018, 10585
[3]  
Chen D W, 2004, RIGOROUS COUPLED WAV
[4]   Novel ATHENA Mark Design to Enhance Alignment Quality in Double Patterning with Spacer Process [J].
Chen, L. W. ;
Yang, Mars ;
Yang, Elvis ;
Yang, T. H. ;
Chen, K. C. ;
Lu, Chih-Yuan .
OPTICAL MICROLITHOGRAPHY XXIII, 2010, 7640
[5]  
CuiY T, 2004, P SPIE, V5375, P1265
[6]   Optical wafer metrology sensors for process-robust CD and overlay control in semiconductor device manufacturing [J].
den Boef, Arie J. .
SURFACE TOPOGRAPHY-METROLOGY AND PROPERTIES, 2016, 4 (02)
[7]  
Du J Y, 2017, Chinese Journal of Lasers, V44
[8]  
DuJ Y, 2019, APPL OPTICS, V58, P9
[9]  
DuJ Y DaiFZ, 2019, CHINESE J LASERS, P46
[10]   Flexible alignment mark design applications using a next generation phase grating alignment system [J].
Hinnen, P ;
Lee, HW ;
Keij, S ;
Takikawa, H ;
Asanuma, K ;
Ishigo, K ;
Higashiki, T .
Metrology, Inspection, and Process Control for Microlithography XIX, Pts 1-3, 2005, 5752 :363-374