Optical tools and techniques for failure analysis of modern integrated circuits

被引：0

作者：

Cole, EI ^{[1
]}

Bruce, MR ^{[1
]}

Barton, DL ^{[1
]}

Tangyunyong, P ^{[1
]}

Bruce, VJ ^{[1
]}

Hawkins, CF ^{[1
]}

Soden, JM ^{[1
]}

Henderson, L ^{[1
]}

Ring, RM ^{[1
]}

Chong, WL ^{[1
]}

Eppes, DH ^{[1
]}

Wilcox, J ^{[1
]}

Benson, DA ^{[1
]}

机构：

[1] Sandia Natl Labs, Livermore, CA 94550 USA

来源：

2003 IEEE LEOS ANNUAL MEETING CONFERENCE PROCEEDINGS, VOLS 1 AND 2 | 2003年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Defect localization in modem ICs can be extremely challenging. To address this complexity several optically based methodologies have been developed over the past decade. These techniques will be described demonstrating their utility in locating defects.

引用

页码：537 / 538

页数：2

共 8 条

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[8] WILLS KS, 1990, ISTFA, P21

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