A robust Co-sputtering fabrication procedure for TiNi shape memory alloys for MEMS

被引：64

作者：

Shih, CL ^{[1
]}

Lai, BK

Kahn, H

Phillips, SM

Heuer, AH

机构：

[1] Case Western Reserve Univ, Dept Mat Sci & Engn, Cleveland, OH 44106 USA

[2] Case Western Reserve Univ, Dept Elect Engn & Comp Sci, Cleveland, OH 44106 USA

来源：

JOURNAL OF MICROELECTROMECHANICAL SYSTEMS | 2001年 / 10卷 / 01期

关键词：

microactuators; shape-memory alloys; sputtering; TiNi;

D O I：

10.1109/84.911094

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Co-sputtering has been used to fabricate equiatomic thin films of TiNi, a shape memory alloy which form the basis of microactuators with many applications in MEMS. Methods for overcoming the difficulties involved in obtaining equiatomic TiNi thin films with high transformation temperatures, and a robust procedure suitable for batch fabrication in a production environment, are described.

引用

页码：69 / 79

页数：11

共 24 条

[1] Thin-film shape-memory alloy actuated micropumps [J].

Benard, WL ;

Kahn, H ;

Heuer, AH ;

Huff, MA .

JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 1998, 7 (02) :245-251

[2] CONTROL COMPOSITION STUDY OF SPUTTERED NI-TI SHAPE-MEMORY ALLOY FILM [J].

BENDAHAN, M ;

CANET, P ;

SEGUIN, JL ;

CARCHANO, H .

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1995, 34 (2-3) :112-115

[3]

Busch J. D., 1990, Proceedings. IEEE Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots (Cat. No.90CH2832-4), P40, DOI 10.1109/MEMSYS.1990.110244

[4] Progress on sputter-deposited thermotractive titanium-nickel films [J].

Grummon, DS ;

Hou, L ;

Zhao, Z ;

Pence, TJ .

JOURNAL DE PHYSIQUE IV, 1995, 5 (C8) :665-670

[5] Relaxation and recovery of extrinsic stress in sputtered titanium-nickel thin films on (100)-Si [J].

Grummon, DS ;

Zhang, JP ;

Pence, TJ .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1999, 273 :722-726

[6]

HAHM G, 2000, P 2000 SOL STAT SENS, P230

[7] The TiNi shape-memory alloy and its applications for MEMS [J].

Kahn, H ;

Huff, MA ;

Heuer, AH .

JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1998, 8 (03) :213-221

[8]

KAHN H, UNPUB HOMOGENEOUS NU

[9] Martensitic transformations and shape memory effect in Ti-Ni sputter-deposited thin films [J].

Kawamura, Y ;

Gyobu, A ;

Horikawa, H ;

Saburi, T .

JOURNAL DE PHYSIQUE IV, 1995, 5 (C8) :683-688

[10]

KHAN H, 1997, MATER RES SOC S P, V444, P227

← 1 2 3 →