Enhanced dielectric and energy-storage properties in BiFeO3-modified Bi0.5(Na0.8K0.2)0.5TiO3 thin films

被引:48
|
作者
Chen, Pan [1 ]
Li, Peng [1 ]
Zhai, Jiwei [1 ]
Shen, Bo [1 ]
Li, Feng [1 ]
Wu, Shuanghao [1 ]
机构
[1] Tongji Univ, Sch Mat Sci & Engn, Minist Educ, Funct Mat Res Lab,Key Lab Adv Civil Engn Mat, Shanghai 201804, Peoples R China
基金
中国国家自然科学基金;
关键词
BNKT-BFO thin films; Sol-gel; Dielectric properties; Energy-storage properties; REDUCED LEAKAGE CURRENT; FERROELECTRIC PROPERTIES; ELECTRICAL-PROPERTIES; DENSITY; STRAIN; COEXISTENCE; CERAMICS; POLYMER; BIFEO3;
D O I
10.1016/j.ceramint.2017.07.039
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Lead free Bi-0.5(Na0.8K0.2)(0.5)TiO3 thin films doped with BiFeO3 (abbreviated as BNKT-xBFO) (x = 0, 0.02, 0.04, 0.08, 0.10) were deposited on Pt(111)/Ti/SiO2/Si substrates by sol-gel/spin coating technique and the effects of BiFe03 content on the crystal structure and electrical properties were investigated in detail. The results showed that all the BNKT-xBFO thin films exhibited a single perovskite phase structure and high-dense surface. Reduced leakage current density, enhanced dielectric and ferroelectric properties were achieved at the optimal composition of BNKT-0.10BFO thin films, with a leakage current density, dielectric constant, dielectric loss and maximum polarization of < 2 x 10(-4) A/cm(3), similar to 978' similar to 0.028 and similar to 74.13 mu C/cm(2) at room temperature, respectively. Moreover, the BNKT-0.10BFO thin films possessed superior energy storage properties due to their slim P-E loops and large maximum polarization, with an energy storage density of 22.12 J/cm(3) and an energy conversion efficiency of 60.85% under a relatively low electric field of 1200 kV/cm. Furthermore, the first half period of the BNKT-0.1OBFO thin film capacitor was about 0.15 mu s, during which most charges and energy were released. The large recoverable energy density and the fast discharge process indicated the potential application of the BNKT-0.1OBFO thin films in electrostatic capacitors and embedded devices.
引用
收藏
页码:13371 / 13376
页数:6
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