Strain and composition dependence of the E1(TO) mode in hexagonal Al1-xInxN thin films

被引:21
作者
Kasic, A [1 ]
Schubert, M
Off, J
Scholz, F
机构
[1] Univ Leipzig, Fak Phys & Geowissensch, D-04103 Leipzig, Germany
[2] Univ Nebraska, Ctr Microelect & Opt Mat Res, Lincoln, NE 68588 USA
[3] Univ Stuttgart, Inst Phys 4, D-70569 Stuttgart, Germany
关键词
D O I
10.1063/1.1355010
中图分类号
O59 [应用物理学];
学科分类号
摘要
Infrared spectroscopic ellipsometry is used to study the influence of strain and composition on the transverse-optical phonon mode of E-1 symmetry in hexagonal Al1-xInxN films for 0.12 less than or equal tox less than or equal to0.21. The 0.1-0.2-mum thick films were grown on slightly compressively strained hexagonal GaN buffer layers, or directly on [0001] sapphire by metalorganic vapor phase epitaxy. The Al1-xInxN E-1(TO) phonon shows a one-mode behavior in contrast to recent theoretical predictions [H. Grille, C. Schnittler, and F. Bechstedt, Phys. Rev. B 61, 6091 (2000)]. Films grown on GaN reveal the influence of strain on the phonon mode frequencies due to pseudomorphic film growth. Al1-xInxN deposited directly on sapphire possesses phonon modes which indicate fully relaxed film growth. (C) 2001 American Institute of Physics.
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页码:1526 / 1528
页数:3
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