Gate and Base Drivers for Silicon Carbide Power Transistors: An Overview

被引:85
|
作者
Peftitsis, Dimosthenis [1 ]
Rabkowski, Jacek [2 ]
机构
[1] ETH, Lab High Power Elect Syst, CH-8092 Zurich, Switzerland
[2] Warsaw Univ Technol, Inst Control & Ind Elect, PL-00662 Warsaw, Poland
关键词
Base driver; gate driver; high efficiency; high switching frequency; high temperature; silicon carbide; switching performance; LOW ON-RESISTANCE; HIGH-TEMPERATURE; SIC-JFET; HIGH-VOLTAGE; PERFORMANCE EVALUATION; HIGH-EFFICIENCY; INTEGRATED-CIRCUIT; RELIABILITY ISSUES; DESIGN; CONVERTER;
D O I
10.1109/TPEL.2015.2510425
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Silicon carbide (SiC) power transistors have started gaining significant importance in various application areas of power electronics. During the last decade, SiC power transistors were counted not only as a potential, but also more importantly as an alternative to silicon counterparts in applications where high efficiency, high switching frequencies, and operation at elevated temperatures are targeted. Various SiC device designs have been proposed and excessive investigations in terms of simulation and experimental studies have shown their advantageous performance compared to silicon technology. On a system-level, however, the design of gate and base drivers for SiC power transistors is very challenging. In particular, a sophisticated driver design is not only associated with properly switching the transistor and decreasing the switching power losses, but also it must incorporate protection features, as well as comply with the electromagnetic compatibility. This paper shows an overview of the gate and base drivers for SiC power transistors which have been proposed by several highly qualified scientists. In particular, the basic operating principle of each driver along with their applicability and drawbacks are presented. For this overview, the three most successful SiC power transistors are considered: junction-field-effect transistors, bipolar-junction transistors, and metal-oxide-semiconductor field-effect transistors. Last but not least, future challenges on gate and base drivers design are also presented.
引用
收藏
页码:7194 / 7213
页数:20
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