The study on 3D electron beam lithography for sub-micrometer diffractive optics

被引：0

作者：

Yin, Hung-Lin ^{[1
]}

Hu, Joseph Y. C. ^{[1
]}

Yu, Chih-Sheng ^{[1
]}

机构：

[1] Instrument Technol Res Ctr, Natl Appl Res Labs, Hsinchu, Taiwan

来源：

2007 IEEE/LEOS INTERNATIONAL CONFERENCE ON OPTICAL MEMS AND NANOPHOTONICS | 2007年

关键词：

electron beam lithography; gray-scale; hologram; Fresnel lens; moth eye;

D O I：

10.1109/OMEMS.2007.4373884

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The fabrication technology of gray-scale electron beam lithography for hologram and Fresnel lens with sub-micrometer features has been reported in this paper. Mass-production of these optical elements by integrating with electroforming and hot embossing has also been demonstrated. For a more critical case, such as antireflective structure array, a novel scattering electron beam lithography has been successfully applied on this application.

引用

页码：149 / 150

页数：2

共 3 条

[1] ONE-STEP 3D SHAPING USING A GRAY-TONE MASK FOR OPTICAL AND MICROELECTRONIC APPLICATIONS [J].

OPPLIGER, Y ;

SIXT, P ;

STAUFFER, JM ;

MAYOR, JM ;

REGNAULT, P ;

VOIRIN, G .

MICROELECTRONIC ENGINEERING, 1994, 23 (1-4) :449-454

[2] Rapid fabrication of diffractive optical elements by use of image-based excimer laser ablation [J].

Wang, XM ;

Leger, JR ;

Rediker, RH .

APPLIED OPTICS, 1997, 36 (20) :4660-4665

[3] Exposure characteristics and three-dimensional profiling of SU8C resist using electron beam lithography [J].

Wong, WH ;

Pun, EYB .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (03) :732-735

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