The annealing effect on structural and optical properties of ZnO thin films produced by r.f. sputtering

被引:14
作者
Rolo, A. G. [1 ]
de Campos, J. Ayres [1 ]
Viseu, T. [1 ]
de Lacerda-Aroso, T. [1 ]
Cerqueira, M. F. [1 ]
机构
[1] Univ Minho, Dept Fis, P-4710057 Braga, Portugal
关键词
ZnO; thin films; X-ray; Raman; stress;
D O I
10.1016/j.spmi.2007.04.069
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
In this work, a study of the structure and optical properties of undoped ZnO thin films produced by r.f. magnetron sputtering technique as a function of the growth parameters is reported. Modification under annealing conditions is also analysed. Raman spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction and optical transmittance have been used. From the position of the (002) X-ray diffraction peak and the E-2 (high) mode detected in Raman spectra, the residual stress both in the as-grown and in the annealed samples has been estimated. (c) 2007 Elsevier Ltd. All rights reserved.
引用
收藏
页码:265 / 269
页数:5
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