Characterization of n-Si/RbAg4I5 interfaces by photocurrent measurements and electrochemical impedance spectroscopy

被引:1
作者
Ohta, N
Takada, K
Sasaki, T
Watanabe, M
机构
[1] Natl Inst Mat Sci, Adv Mat Lab, Tsukuba, Ibaraki 3050044, Japan
[2] Japan Sci & Technol Agcy, Core Res Evolut Sci & Technol, Kawaguchi 3320012, Japan
关键词
D O I
10.1149/1.1915243
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
A photoelectrochemical cell with an n-Si/RbAg4I5 interface showed a high open-circuit potential (V∞ = 0.69 V) and a high incident photon-to-current conversion efficiency (> 70%) in a wide range of wavelengths from visible to near-infrared light (500- 900 nm). An electronic structure model at the interface was proposed from electrochemical data involving electrochemical impedance spectra to elucidate the origin of the high V-oc. The flatband potential was determined to be -0.09 V obtained from a Mott-Schottky plot, which led to band-edge potentials of -0.33 and 0.79 V for the conduction band and the valence band, respectively. The redox potential of the I-/I-2 couple (0.65 V), which donates electrons to photogenerated holes in the valence band, was higher but close to the band-edge potential of the valence band, resulting in the high Voc. © 2005 The Electrochemical Society. All rights reserved.
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收藏
页码:A1241 / A1247
页数:7
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