Z-DOL and carbon overcoat: Bonding mechanism

被引:31
作者
Kasai, PH [1 ]
Spool, AM
机构
[1] IBM Corp, Almaden Res Ctr, Div Res, San Jose, CA 95120 USA
[2] IBM Corp, Storage Technol Div, San Jose, CA 95120 USA
关键词
bonding of Z-DOL; carbon overcoat; magnetic recording disks; perfluoropolyethers;
D O I
10.1109/20.917644
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
It has been postulated earlier that the bonding between Z-DOL and sputtered carbon occurs when a hydrogen atom is transferred from a hydroxyl end group of Z-DOL to a dangling bond site shielded inside the sp(3) type (diamondlike) granules of the carbon film, and the Z-DOL moiety is linked to the carbon as an alkoxyl group, HO-CH2-CF2-O-(-CF2-CF2-O-)(m)-(-CF2-O-)(n)-CF2-CH2-O-[carbon], The postulated mechanism predicts that the Z-DOL bonding should occur spontaneously if freshly sputtered carbon were exposed to Z-DOL molecules without prior exposure to air, and that, for disks lubricated with Z-DOL, there would be less hydroxyl hydrogens, and there would exist the alkoxyl units depicted above, A recent reported result on vacuum deposition of Z-DOL (without prior exposure to air) clearly revealed the predicted spontaneous bonding, and analyzes by TOF-SIMS of disks lubricated with Z-DOL demonstrated the predicted decrease of the hydroxyl hydrogen and emergence of the predicted alkoxyl units as the bonding fraction of Z-DOL increases.
引用
收藏
页码:929 / 933
页数:5
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