共 50 条
- [1] X-window based semiconductor lithography and etching process simulator PROCEEDING OF THE TENTH INTERNATIONAL WORKSHOP ON THE PHYSICS OF SEMICONDUCTOR DEVICES, VOLS I AND II, 2000, 3975 : 1353 - 1356
- [2] CRYSTAL ORIENTATION DEPENDENT ETCHING IN RIE AND ITS APPLICATION 2011 IEEE 24TH INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS (MEMS), 2011, : 217 - 220
- [3] Etching mask effect of the nanoscratched borosilicate surface and its application to maskless pattern fabrication PRICM 5: THE FIFTH PACIFIC RIM INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS AND PROCESSING, PTS 1-5, 2005, 475-479 : 3479 - 3482
- [6] Mask Process Correction (MPC) modeling and its application to EUV mask for Electron beam mask writer, EBM-7000 PHOTOMASK TECHNOLOGY 2010, 2010, 7823
- [9] Compound Velocity Synchronizing Control Strategy for Electro-Hydraulic Load Simulator and Its Engineering Application JOURNAL OF DYNAMIC SYSTEMS MEASUREMENT AND CONTROL-TRANSACTIONS OF THE ASME, 2014, 136 (05):