Phaw noise study of AlGaN/GaN HEMT X-band oscillator

被引:6
|
作者
Danylyuk, SV [1 ]
Vitusevich, SA [1 ]
Kaper, V [1 ]
Tilak, V [1 ]
Klein, N [1 ]
Eastman, LF [1 ]
Shealy, JR [1 ]
机构
[1] Forschungszentrum Julich, Inst Schichten & Grenazflachen, D-52425 Julich, Germany
关键词
D O I
10.1002/pssc.200461457
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
AlGaM/GaN high electron mobility transistor (HEMT) heterostructures were investigated by noise spectral density measurements. The heterostructure layers are grown without intentionally doping the barrier material and two-dimensional gas appears at the interface only due to polarization effects. Low-frequency noise spectra of the HEMT were studied in a wide range of applied voltages. They demonstrated a deviation from 1/f dependence at high applied drain-source voltages due to increasing dissipated power. The phase noise of a monolithic microwave integrated circuit oscillator based on the AlGaN/GaN HEMT amplifier was investigated. In spite of the low value of the resonator quality factor of 20, a low level of the phase noise of the oscillator was registered. The up-conversion factor was found to be as low as 15 MHz/V for frequency offset 100 kHz, demonstrating that AlGaN/GaN HEMTs offer an excellent potential for a wide range of microwave applications. (c) 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:2615 / 2618
页数:4
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