Propagation of dislocations in diamond (111) homoepitaxial layer

被引:5
作者
Ichikawa, Kimiyoshi [1 ]
Koizumi, Satoshi [1 ]
Teraji, Tokuyuki [1 ]
机构
[1] Natl Inst Mat Sci, Tsukuba 3050044, Japan
关键词
X-RAY TOPOGRAPHY; CRYSTALLINE QUALITY; HIGH-PURITY; GROWTH; DEFECTS;
D O I
10.1063/5.0096444
中图分类号
O59 [应用物理学];
学科分类号
摘要
Dislocations in a diamond (111) homoepitaxial layer were investigated in terms of the line directions and types. After a thick homoepitaxial layer was grown on a {111} high-pressure high-temperature (HPHT) substrate using chemical vapor deposition (CVD), the Raman spectra of diamond were taken using a confocal setup to obtain the spatial distribution of the peak positions of the diamond Raman line. Dislocations in the CVD layer and HPHT substrate were detected as local stress variation in the peak position images. The line directions of dislocations were, respectively, [112] for the HPHT substrate and [011] for the CVD layer. Local stress variation was in the [ 1 over bar 1 over bar 2] direction in both the CVD layer and the HPHT substrate. The Burgers vector deduced from the local stress-variation direction indicated the dislocation structures, respectively, as an edge type for [112] dislocations in the HPHT substrate and as a 60 & DEG; mixed type for [011] dislocations in the CVD layer. Because both dislocations had the same slip plane, the line direction and dislocation type changed on the same slip plane at the CVD layer/HPHT substrate interface, when dislocation in the HPHT substrate reached the CVD layer. Published under an exclusive license by AIP Publishing.
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页数:13
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