Effect of substrate temperatures on texture in thin films by magnetron sputtering

被引：8

作者：

Cheng, FX ^{[1
]}

Jiang, CH ^{[1
]}

Wu, JS ^{[1
]}

机构：

[1] Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, Key Lab High Temp Mat & Tests, Minist Educ, Shanghai 200030, Peoples R China

来源：

MATERIALS LETTERS | 2005年 / 59卷 / 12期

基金：

中国国家自然科学基金;

关键词：

texture; thin films; X-ray diffraction; magnetron sputtering;

D O I：

10.1016/j.matlet.2005.01.015

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The (111) texture was found in the as-deposited CoSi2 thin film prepared by rf magnetron sputtering using CoSi2 alloy target. It was found that the (111) texture was increased firstly and then decreased with the increasing substrate temperature. The result was compared with the other results. A new idea was proposed to explain the effect of substrate temperatures on the texture. (c) 2005 Elsevier B.V. All rights reserved.

引用

收藏

页码：1530 / 1532

页数：3

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