Performance evaluation of run-to-run control methods in semiconductor processes

被引：0

作者：

Zhang, C ^{[1
]}

Deng, H ^{[1
]}

Baras, JS ^{[1
]}

机构：

[1] Univ Maryland, Dept Elect & Comp Engn, College Pk, MD 20742 USA

来源：

CCA 2003: PROCEEDINGS OF 2003 IEEE CONFERENCE ON CONTROL APPLICATIONS, VOLS 1 AND 2 | 2003年

关键词：

D O I：

暂无

中图分类号：

TP [自动化技术、计算机技术];

学科分类号：

0812 ;

摘要：

Run-to-Run (RtR) control plays an important role in semiconductor manufacturing processes. In this paper, RtR control methods are classified and evaluated. The set-valued RtR controllers with ellipsoid approximation are compared with two typical RtR controllers: the Exponentially Weighted Moving Average (EWMA) controller and the Optimizing Adaptive Quality Controller (OAQC) by simulations according to the following criteria: A good RtR controller should be able to compensate for various disturbances, such as small drifts, step disturbances and model errors; moreover, it should be able to deal with bounds, cost requirement and multiple targets that are often encountered in semiconductor processes. Based on our simulation results, suggestions on selection of a proper RtR controller for a semiconductor process are given as conclusions.

引用

页码：841 / 848

页数：8

共 18 条

[1] Baras J. S., 1996, IEEE Transactions on Components, Packaging & Manufacturing Technology, Part C (Manufacturing), V19, P98, DOI 10.1109/3476.507145
[2] Boning D, 1995, SEVENTEENTH IEEE/CPMT INTERNATIONAL ELECTRONICS MANUFACTURING TECHNOLOGY SYMPOSIUM: MANUFACTURING TECHNOLOGIES - PRESENT AND FUTURE, P81, DOI 10.1109/IEMT.1995.526097
[3] SUPERVISORY RUN-TO-RUN CONTROL OF POLYSILICON GATE ETCH USING IN-SITU ELLIPSOMETRY
BUTLER, SW
STEFANI, JA
[J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1994, 7 (02) : 193 - 201
[4] CASTILLO ED, 1998, IEEE T SEMICONDUCTOR, V11, P285
[5] ASYMPTOTICALLY CONVERGENT MODIFIED RECURSIVE LEAST-SQUARES WITH DATA-DEPENDENT UPDATING AND FORGETTING FACTOR FOR SYSTEMS WITH BOUNDED NOISE
DASGUPTA, S
HUANG, YF
[J]. IEEE TRANSACTIONS ON INFORMATION THEORY, 1987, 33 (03) : 383 - 392
[6] DENG H, 1999, THESIS U MARYLAND CO
[7] Himmel C., 1993, IEEE T SEMICONDUCTOR, V6
[8] HUANG YL, 1994, IEEE T SEMICONDUCTOR, V7
[9] STABILITY AND SENSITIVITY OF AN EWMA CONTROLLER
INGOLFSSON, A
SACHS, E
[J]. JOURNAL OF QUALITY TECHNOLOGY, 1993, 25 (04) : 271 - 287
[10] An evaluation of model predictive control in run to run processing in semiconductor manufacturing
Mullins, JA
Campbell, WJ
Stock, AD
[J]. PROCESS, EQUIPMENT, AND MATERIALS CONTROL IN INTEGRATED CIRCUIT MANUFACTURING III, 1997, 3213 : 182 - 189

← 1 2 →