Thin film growth of yttria stabilized zirconia by aerosol assisted chemical vapor deposition

被引：30

作者：

Schlupp, M. V. F. ^{[1
]}

Prestat, M. ^{[1
]}

Martynczuk, J. ^{[1
]}

Rupp, J. L. M. ^{[1
]}

Bieberle-Huetter, A. ^{[1
]}

Gauckler, L. J. ^{[1
]}

机构：

[1] ETH, CH-8093 Zurich, Switzerland

来源：

JOURNAL OF POWER SOURCES | 2012年 / 202卷

基金：

瑞士国家科学基金会;

关键词：

Thin film deposition; AA-CVD; Deposition mechanism; SOFC electrolyte; YSZ; YSZ FILMS; OXIDE; ZRO2; Y2O3; LAYERS; SOFC; CVD; TEMPERATURE; ELECTROLYTE; ZR(DPM)(4);

D O I：

10.1016/j.jpowsour.2011.11.016

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Thin film growth of yttria stabilized zirconia (YSZ) using atmospheric aerosol assisted chemical vapor deposition (AA-CVD) from beta-diketonates is studied. The influence of nature and concentration of metal precursors and solvents on thin film growth, microstructure and composition is investigated as a function of deposition temperature. AA-CVD is able to produce smooth and homogeneous YSZ thin films of controlled thickness and stoichiometry. Amorphous, nanocrystalline or columnar microstructures can be obtained at deposition temperatures between 300 and 650 degrees C. In the same temperature regime, a transition from surface reaction to diffusion controlled film growth is observed. For applications as gas separating membranes, e.g. for micro-solid oxide fuel cell electrolytes, randomly oriented nanocrystalline microstructures with grain sizes in the range of 10 nm are promising. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：47 / 55

页数：9

共 38 条

[1]

[Anonymous], CHEM ADV MAT

[2] THIN-LAYERS DEPOSITED BY THE PYROSOL PROCESS [J].