Step structure of silicon surface hydrogenated in solution as revealed with angle-resolved polarized infrared spectroscopy

被引:13
作者
Watanabe, S [1 ]
机构
[1] Fujitsu Labs Ltd, Atsugi, Kanagawa 2430197, Japan
关键词
chemisorption; hydrogen; infrared absorption spectroscopy; silicon; stepped single crystal surfaces;
D O I
10.1016/S0039-6028(98)00588-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Surface vibrations due to H atoms chemisorbed on a vicinal Si(lll) surface with [(1) over bar (1) over bar 2] steps were studied by angle-resolved polarized infrared spectroscopy. We observed stretching and wagging of the Si-H bonds and scissoring of the SiH2 structures, the last of which was missed in the previous investigation. To determine the direction of the dynamic polarization of each vibration, the surface electrical held made by the infrared beam was rotated in the ((1) over bar 10) plane. The step-edge structure was deduced by adopting the three-layer model. It was revealed that this step edge was formed by a strained vertical dihydride and a strained monohydride complex and that the dihydride was rotated to the [111] axis at 21 degrees from its bulk-terminated position resulting in a large angle of 65 degrees to the optical surface. This fully explains the discrepancy with the previous results regarding the electron energy loss and infrared spectra. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:385 / 391
页数:7
相关论文
共 31 条
[1]  
[Anonymous], UNPUB
[2]   INFRARED-SPECTROSCOPY OF SI(111) SURFACES AFTER HF TREATMENT - HYDROGEN TERMINATION AND SURFACE-MORPHOLOGY [J].
BURROWS, VA ;
CHABAL, YJ ;
HIGASHI, GS ;
RAGHAVACHARI, K ;
CHRISTMAN, SB .
APPLIED PHYSICS LETTERS, 1988, 53 (11) :998-1000
[3]   INFRARED-SPECTROSCOPY OF SI(111) AND SI(100) SURFACES AFTER HF TREATMENT - HYDROGEN TERMINATION AND SURFACE-MORPHOLOGY [J].
CHABAL, YJ ;
HIGASHI, GS ;
RAGHAVACHARI, K ;
BURROWS, VA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03) :2104-2109
[4]   HIGH-RESOLUTION INFRARED STUDY OF HYDROGEN CHEMISORBED ON SI(100) [J].
CHABAL, YJ ;
CHABAN, EE ;
CHRISTMAN, SB .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1983, 29 (JAN) :35-40
[5]   MORPHOLOGY OF HYDROGEN-TERMINATED SI(111) AND SI(100) SURFACES UPON ETCHING IN HF AND BUFFERED-HF SOLUTIONS [J].
DUMAS, P ;
CHABAL, YJ ;
JAKOB, P .
SURFACE SCIENCE, 1992, 269 :867-878
[6]   ELECTRON-ENERGY LOSS SPECTROSCOPY OF H-TERMINATED SI(111) AND SI(100) PREPARED BY CHEMICAL ETCHING [J].
DUMAS, P ;
CHABAL, YJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04) :2160-2165
[7]   SURFACE ELECTROMAGNETIC-FIELDS [J].
FEIBELMAN, PJ .
PROGRESS IN SURFACE SCIENCE, 1982, 12 (04) :287-407
[8]  
GRAF D, 1990, J APPL PHYS, V68, P5155, DOI 10.1063/1.347056
[9]   INVESTIGATIONS ON HYDROPHILIC AND HYDROPHOBIC SILICON (100) WAFER SURFACES BY X-RAY PHOTOELECTRON AND HIGH-RESOLUTION ELECTRON-ENERGY LOSS-SPECTROSCOPY [J].
GRUNDNER, M ;
JACOB, H .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1986, 39 (02) :73-82
[10]   IDEAL HYDROGEN TERMINATION OF THE SI-(111) SURFACE [J].
HIGASHI, GS ;
CHABAL, YJ ;
TRUCKS, GW ;
RAGHAVACHARI, K .
APPLIED PHYSICS LETTERS, 1990, 56 (07) :656-658