A study of initial growth mechanism of c-GaN on GaAs(100) by molecular beam epitaxy

被引:13
作者
Kimura, R
Gotoh, Y
Nagai, T
Uchida, Y
Matsuzawa, T
Takahashi, K
Schulz, CG
机构
[1] Teikyo Univ Sci & Technol, Dept Elect & Informat Sci, Yamanashi 40901, Japan
[2] Paul Drude Inst Solid State Elect, D-10117 Berlin, Germany
关键词
c-GaN; buffer; GaAs; MBE; RF-plasma;
D O I
10.1016/S0022-0248(98)00325-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The surface morphology of several kinds of buffer layers. nitrided GaAs(1 0 0), low-temperature GaN, GaAs buffer layer, and GaAlAs buffer layer, is investigated for rowing c-GaN using GaAs(1 0 0) by molecular beam epitaxy. The possibility of an epitaxial GaAlAs buffer layer for growing high-quality c-GaN on GaAs(1 0 0) is considered. A c-GaN Film with a few h-GaN imperfections is successfully grown on a GaAs buffer layer, and the occurrence of h-GaN is drastically reduced by introducing an epitaxial GaAs buffer layer. (C) 1998 Published by Elsevier Science B.V. All rights reserved.
引用
收藏
页码:406 / 410
页数:5
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