Total ionizing dose effects on Ag/ amorphous Bi3.15Nd0.85Ti3O12/Pt resistive switching memory

被引:1
作者
Song, H. J. [1 ,2 ]
Yan, W. Z. [1 ,2 ]
Zhong, X. L. [1 ,2 ]
Zheng, S. Z. [1 ,2 ]
Yang, Shengsheng [3 ]
Xue, Yuxiong [3 ]
Wang, Guangyi [3 ]
Guo, H. X. [1 ,2 ]
Wang, J. B. [1 ,2 ]
机构
[1] Xiangtan Univ, Sch Mat Sci & Engn, Xiangtan 411105, Hunan, Peoples R China
[2] Xiangtan Univ, Natl Prov Lab Special Funct Thin Film Mat, Xiangtan 411105, Hunan, Peoples R China
[3] Lanzhou Inst Phys, Natl Key Lab Sci & Technol Vacuum Technol & Phys, Lanzhou 730000, Gansu, Peoples R China
基金
中国国家自然科学基金;
关键词
Total ionizing dose effects; Resistive switching memory; Ag electrode; Amorphous Bi3.15Nd0.85Ti3O12 thin film; RADIATION; MECHANISMS; FILAMENTS; HARDNESS; FILM;
D O I
10.1016/j.matchemphys.2018.08.015
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Here, the Ag/amorphous Bi3.15Nd0.85Ti3O12/Pt resistive switching memories were designed and prepared, and the total ionizing dose (TID) effects of Co-60 gamma-ray on the Ag/amorphous Bi3.15Nd0.85Ti3O12/Pt resistive switching memories were investigated. The results show that the resistance in low resistance state (LRS), resistance in high resistance state (HRS), and set voltage are almost immune to a TID up to 1 Mrad(Si), whereas the reset voltage and forming voltage are impacted slightly. The good radiation immunity is related to the metallic conductive filaments and the amorphous Bi3.15Nd0.85Ti3O12/Pt matrix. These results suggest that the Ag/amorphous Bi3.15Nd0.85Ti3O12/Pt devices show potential for radiation-hard electronics applications.
引用
收藏
页码:340 / 346
页数:7
相关论文
共 36 条
  • [11] Gonzalez-Velo Y., 2015, 15 EUR C RAD ITS EFF
  • [12] Observation of conductive filaments in a resistive switching nonvolatile memory device based on amorphous InGaZnO thin films
    Kang, Youn Hee
    Lee, Tae Il
    Moon, Kyeong-Ju
    Moon, Jiwon
    Hong, Kwon
    Cho, Joong-Hwee
    Lee, Woong
    Myoung, Jae-Min
    [J]. MATERIALS CHEMISTRY AND PHYSICS, 2013, 138 (2-3) : 623 - 627
  • [13] Cross-Point Resistive Switching Memory and Urea Sensing by Using Annealed GdOx Film in IrOx/GdOx/W Structure for Biomedical Applications
    Kumar, Pankaj
    Maikap, Siddheswar
    Ginnaram, Sreekanth
    Qiu, Jian-Tai
    Jana, Debanjan
    Chakrabarti, Somsubhra
    Samanta, Subhranu
    Singh, Kanishk
    Roy, Anisha
    Jana, Surajit
    Dutta, Mrinmoy
    Chang, Ya-Ling
    Cheng, Hsin-Ming
    Mahapatra, Rajat
    Chiu, Hsien-Chin
    Yang, Jer-Ren
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2017, 164 (04) : B127 - B135
  • [14] SIMPLIFIED THEORY OF SPACE-CHARGE-LIMITED CURRENTS IN AN INSULATOR WITH TRAPS
    LAMPERT, MA
    [J]. PHYSICAL REVIEW, 1956, 103 (06): : 1648 - 1656
  • [15] Initial Assessment of the Effects of Radiation on the Electrical Characteristics of TaOX Memristive Memories
    Marinella, Matthew J.
    Dalton, Scott M.
    Mickel, Patrick R.
    Dodd, Paul. E. Dodd
    Shaneyfelt, Marty R.
    Bielejec, Edward
    Vizkelethy, Gyorgy
    Kotula, Paul G.
    [J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2012, 59 (06) : 2987 - 2994
  • [16] McLain ML, 2015, 2015 IEEE AEROSPACE CONFERENCE
  • [17] Total Dose Hardness of Tin/HfOx/TiN Resistive Random Access Memory
    Morgan, Katrina A.
    Huang, Ruomeng
    Potter, Kenneth
    Shaw, Chris
    Redman-White, William
    De Groot, C. H.
    [J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2014, 61 (06) : 2991 - 2996
  • [18] Oldham T. R., 2010, 1 NASA EL PARTS PACK
  • [19] Recent progress in resistive random access memories: Materials, switching mechanisms, and performance
    Pan, F.
    Gao, S.
    Chen, C.
    Song, C.
    Zeng, F.
    [J]. MATERIALS SCIENCE & ENGINEERING R-REPORTS, 2014, 83 : 1 - 59
  • [20] Comparison of resistive switching characteristics by using e-gun/sputter deposited SiOx film in W/SiOx/TiN structure and pH/creatinine sensing through iridium electrode
    Roy, Sourav
    Roy, Anisha
    Panja, Rajeswar
    Samanta, Subhranu
    Chakrabarti, Somsubhra
    Yu, Po-Lin
    Maikap, Siddheswar
    Cheng, Hsin-Ming
    Tsai, Ling-Na
    Qiu, Jian-Tai
    [J]. JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 726 : 30 - 40