Large area ZnO: Al films with tailored-light scattering properties for photovoltaic applications

被引：63

作者：

Ruske, F. ^{[1
]}

Jacobs, C. ^{[1
]}

Sittinger, V. ^{[1
]}

Szyszka, B. ^{[1
]}

Werner, W. ^{[1
]}

机构：

[1] Fraunhofer Inst Surface Engn & Thin Films IST, D-38108 Braunschweig, Germany

来源：

THIN SOLID FILMS | 2007年 / 515卷 / 24期

关键词：

al-doped zinc oxide; Magnetron sputtering; Thin film solar cells-; Wet chemical etching; Light scattering propertiesal-doped zinc oxide; Thin film solar cells; Light scattering properties;

D O I：

10.1016/j.tsf.2007.03.107

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Aluminum-doped zinc oxide films on glass are promising substrates for use in thin film solar cells based on amorphous and amorphous/ microcrystalline silicon absorber material. The films can be produced by magnetron sputtering on large scale at relative low cost. Especially reactive sputtering of metallic Zn/Al compound targets is a cheap way to produce films at high deposition rate. One drawback of amorphous silicon is the low absorption in the near infrared spectral range. Wet chemical etching has been used to produce a rough TCO surface that enables light trapping in the absorber. The etching behaviour of ZnO:Al films can be tuned by changing oxygen partial pressure during deposition. The etching behaviour is compared to ZnO structure and discussed regarding the performance of solar cells deposited onto the etched films. (c) 2007 Elsevier B.V All,rights reserved.

引用

页码：8695 / 8698

页数：4

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