Capacitance-voltage profiling of quantum well structures

被引:25
作者
Tschirner, BM
MorierGenoud, F
Martin, D
Reinhart, FK
机构
[1] Inst. de Micro-et Optoelectronique, Ecl. Polytech. Federale de Lausanne
关键词
D O I
10.1063/1.361466
中图分类号
O59 [应用物理学];
学科分类号
摘要
Capacitance-voltage (C-V) analysis of high quality MBE grown quantum well samples shows that carrier distributions are averaged over the scale of the Debye length. This averaging process results in strongly temperature dependent C-V-deduced doping distributions that can be very different from the actual ones. The doping distribution of the structure is obtained by fitting numerically simulated curves to the measured C-V curves and doping profiles, respectively. Although the calculations do not take quantum size effects into account they show good agreement with the measured data. (C) 1996 American Institute of Physics.
引用
收藏
页码:7005 / 7013
页数:9
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