Structural and Electrical Properties of TiO2 Thin films

被引：23
|
作者：
Rao, M. C. [1 ]
Ravindranadh, K. [1 ]
Shekhawat, M. S. [2 ]
机构：
[1] Andhra Loyola Coll, Dept Phys, Vijayawada 520008, India
[2] Engn Coll Bikaner, Dept Phys, Bikaner 334004, India
来源：
INTERNATIONAL CONFERENCE ON CONDENSED MATTER AND APPLIED PHYSICS (ICC 2015) | 2016年 / 1728卷
关键词：
TiO2; Thin films; Pulsed Laser Deposition; X-ray diffraction and Electrical properties;
D O I：
10.1063/1.4946128
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Titanium dioxide (TiO2) is traditionally the most widely used white pigment due to its high refractive index. Titanium dioxide (TiO2) is traditionally the most widely used white pigment due to its high refractive index. TiO2 has received considerable attention and it has been used for optical coatings, photo-catalysis agents, gas sensors and solar cells. In this Work, nano-structured TiO2 thin-films were grown by pulsed laser deposition (PLD) technique on glass substrates. The prepared thin films were annealed from 400-600 degrees C in air for a period of 2 hours. Effect of annealing on the structural and electrical properties was studied. X-ray diffraction pattern exhibits peaks correspond to tetragonal anatase phase of TiO2 and the evaluated average crystallite size of the prepared materials are in the range of 16 to 30 nm. Electrical properties of the prepared samples are analyzed.
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页数：4
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