Compact coating of tantalum on tungsten prepared by molten salt electrodeposition

被引：7

作者：

Mehmood, M

Kawaguchi, N

Maekawa, H

Sato, Y

Yamamura, T

Kawai, M

Kikuchi, K

Furusaka, M

机构：

[1] High Energy Accelerator Res Org, Tsukuba, Ibaraki 3050801, Japan

[2] Japan Atom Energy Res Inst, Tokai, Ibaraki 3191195, Japan

[3] Pakistan Inst Engn & Appl Sci, Dept Chem & Mat Engn, Islamabad 45650, Pakistan

来源：

MATERIALS TRANSACTIONS | 2003年 / 44卷 / 09期

关键词：

tantalum; tungsten; coating; molten salt; fluoride; interface; electrodeposition; voltammetry and chronopotentiometry;

D O I：

10.2320/matertrans.44.1659

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Attempts to prepare tantalum coating on tungsten have been performed in 55 mol%LiF-35 mol%NaF-10mol%CaF2 melt containing K2TaF7. Electrolytic deposition of tantalum was carried out by galvanostatic polarization. A conproportionation reaction also occurred that interfered with the electrodeposition and resulted in decrease in current efficiency. However, the product of this reaction was soluble, which diffused away from the electrode without contaminating the deposit. Hence, a compact electrodeposited tantalum coating was obtained on tungsten substrate. An excellent interface was possible when coating was performed in the melt containing 2 mol% K2TaF7.

引用

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页码：1659 / 1662

页数：4

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