Characterization of ZnO:Al films, deposited on organic substrate by r.f. magnetron sputtering

被引：0
作者：
Ma, J [1 ]
Hao, XT
Zhang, SY
Ma, HL
机构：
[1] Shandong Univ, Sch Phys & Microelect, Inst Optoelect Mat & Devices, Jinan 250100, Peoples R China
[2] Chang An Univ, Inst Sci, Xian 710064, Peoples R China
来源：
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY | 2003年 / 19卷 / 04期
关键词：
zinc oxide; microstructure; electrical and optical properties;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Transparent conducting Al-doped zinc oxide (ZnO:Al) films with good adhesion have been deposited on polyimide thin film substrates by r.f. magnetron sputtering technique at low substrate temperature (25similar to180degreesC). The structural, optical and electrical properties of the deposited films were investigated.. High quality films with electrical resistivity as low as 8.5X10(-4) Omega.cm and the average transmittance over 74% in the wavelength range of the visible spectrum have been obtained. The electron carrier concentrations are in the range from 2.9x10(20) to 7.1x10(20) cm(-3) with mobilities from 4 to 8.8 cm(2) V(-1)s(-1). The densities of the films are in the range from 4.58 to 5.16 g/cm(-3).
引用
收藏
页码：363 / 365
页数：3
相关论文
共 50 条
  • [31] Influence of Substrate Temperature on the Characteristics of Zinc Oxide Thin Films Deposited by Magnetron Sputtering
    Gu, J. H.
    Zhong, Z. Y.
    He, X.
    Hou, J.
    Yang, C. Y.
    PROGRESS IN NEW MATERIALS AND MECHANICS RESEARCH, 2012, 502 : 111 - +
  • [32] Vibrational properties and structure of undoped and Al-doped ZnO films deposited by RF magnetron sputtering
    Tzolov, M
    Tzenov, N
    Dimova-Malinovska, D
    Kalitzova, M
    Pizzuto, C
    Vitali, G
    Zollo, G
    Ivanov, I
    THIN SOLID FILMS, 2000, 379 (1-2) : 28 - 36
  • [33] Substrate temperature dependence of the properties of Ga-doped ZnO films deposited by DC reactive magnetron sputtering
    Ma, Quan-Bao
    Ye, Zhi-Zhen
    He, Hai-Ping
    Wang, Jing-Rul
    Zhu, Li-Ping
    Zhao, Bing-Hui
    VACUUM, 2007, 82 (01) : 9 - 14
  • [34] Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering
    Singh, Sukhvinder
    Srinivasa, R. S.
    Major, S. S.
    THIN SOLID FILMS, 2007, 515 (24) : 8718 - 8722
  • [35] Al- and Al:In-doped ZnO thin films deposited by RF magnetron sputtering for spacecraft charge mitigation
    Lennon, C.
    Kodama, R.
    Chang, Y.
    Sivananthan, S.
    Deshpande, M.
    JOURNAL OF ELECTRONIC MATERIALS, 2008, 37 (09) : 1324 - 1328
  • [36] Influence of sputter-etching of substrate on the microstructural and optical properties of ZnO films deposited by RF magnetron sputtering
    Li, C. P.
    Yang, B. H.
    Wang, X. C.
    Wang, F.
    Li, M. J.
    Su, L.
    Li, X. W.
    APPLIED SURFACE SCIENCE, 2011, 257 (14) : 5998 - 6003
  • [37] Al- and Al:In-Doped ZnO Thin Films Deposited by RF Magnetron Sputtering for Spacecraft Charge Mitigation
    C. Lennon
    R. Kodama
    Y. Chang
    S. Sivananthan
    M. Deshpande
    Journal of Electronic Materials, 2008, 37 : 1324 - 1328
  • [38] Relation between surface and bulk electronic properties of Al doped ZnO films deposited at varying substrate temperature by radio frequency magnetron sputtering
    Singh, C. C.
    Patel, T. A.
    Panda, E.
    JOURNAL OF APPLIED PHYSICS, 2015, 117 (24)
  • [39] Effects of Substrate-Target Distance and Si Co-Doping on the Properties of Al-Doped ZnO Films Deposited by Magnetron Sputtering
    Xu Hao
    Lu Fang
    Fu Zheng-Wen
    ACTA PHYSICO-CHIMICA SINICA, 2011, 27 (05) : 1232 - 1238
  • [40] Effect of substrate temperature on transparent conducting Al and F co-doped ZnO thin films prepared by rf magnetron sputtering
    Wang, Fang-Hsing
    Chang, Chiao-Lu
    APPLIED SURFACE SCIENCE, 2016, 370 : 83 - 91
12345