Use of a high-frequency magnetron discharge for the utilization of chlorinated gases

被引:0
|
作者
Vetoshkin, VM [1 ]
Danilov, AA [1 ]
Krylov, PN [1 ]
机构
[1] Udmurt State Univ, Izhevsk 426034, Russia
关键词
Copper; Aluminum; Physical Chemistry; Chlorinate; Solid State;
D O I
10.1023/A:1025154720536
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The possibility of applying a high-frequency magnetron discharge for the utilization of a chlorinated gas used for the reactive-ion etching of copper and aluminum is discussed. It is shown that a high-frequency magnetron discharge can be used for binding reactive-gas components and transforming them from the gas to the solid state. The dependence of the utilization efficiency on the high-frequency power, the magnetic-field strength, and the target material is studied.
引用
收藏
页码:554 / 557
页数:4
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