Atomic resolution microscopy of semiconductor defects and interfaces

被引:0
作者
James, EM
Browning, ND
Xin, Y
Reno, JL
Baca, AG
机构
[1] Univ Illinois, Dept Phys, Chicago, IL 60607 USA
[2] Sandia Natl Labs, Albuquerque, NM 87185 USA
来源
MICROSCOPY OF SEMICONDUCTING MATERIALS 1999, PROCEEDINGS | 1999年 / 164期
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D O I
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中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The optical-arrangement of the scanning transmission electron microscope (STEM) allows formation of incoherent images by use of a large annular detector. Here we show this capability in the imaging of defects in GaN and the interfacial region of an Au/GaAs ohmic contact. A resolution of around 0.15 nm is attained. Such "Z-contrast" images show strong atomic number contrast and allow the probe to be positioned accurately at the defect or interface for the purpose of performing high spatial resolution electron energy-loss spectroscopy (EELS).
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页码:11 / 14
页数:4
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