Nanopatterning of swinging substrates by ion-beam sputtering

被引:5
|
作者
Yoon, Sun Mi [1 ]
Kim, J. -S. [1 ]
机构
[1] Sookmyung Womens Univ, Dept Phys, Seoul 140742, South Korea
关键词
PATTERN-FORMATION; SURFACE; BOMBARDMENT; TOPOGRAPHY;
D O I
10.1063/1.4951005
中图分类号
O59 [应用物理学];
学科分类号
摘要
Graphite substrates are azimuthally swung during ion-beam sputtering (IBS) at a polar angle h theta = 78 degrees from the surface normal. The swinging of the substrate not only causes quasi-two-dimensional mass transport but also makes various sputter effects from the different incident angles to work together. Through variation of the swing angle, both the transport and sputtering effects synergistically produce a series of salient patterns, such as asymmetric wall-like structures, which can grow to several tens of nanometers and exhibit a re-entrant orientational change with the increased swing angle. Thus, the present work demonstrates that dynamic variables such as the swing angle, which have been little utilized, offer an additional parameter space that can be exploited to diversify the sputtered patterns, thereby expanding the applicability of an IBS as well as the comprehension of the IBS nano patterning mechanism. Published by AIP Publishing.
引用
收藏
页数:6
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