In-plane magnetic anisotropy and coercive field dependence upon thickness of CoFeB

被引:52
作者
Kipgen, Lalminthang [1 ]
Fulara, Himanshu [1 ]
Raju, M. [1 ]
Chaudhary, Sujeet [1 ]
机构
[1] Indian Inst Technol, Thin Film Lab, Dept Phys, New Delhi 110016, India
关键词
Coercivity; Magnetic anisotropy; Amorphous/nanocrystalline material;
D O I
10.1016/j.jmmm.2012.05.012
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The structural and magnetic properties of as-grown 5-50 nm thin ion-beam sputter deposited transition metal-metalloid Co20Fe60B20 (CFB) films are reported in this communication. A broad peak observed at 2 theta similar to 45 degrees in the glancing angle X-ray diffraction pattern revealed the formation of very fine nano-sized grains embedded in majority amorphous CFB matrix. Although no magnetic field is applied during deposition, the longitudinal magneto-optic Kerr effect measurements performed at 300 K in these as-grown films clearly established the presence of in-plane uniaxial magnetic anisotropy (K-u). It is argued that this observed anisotropy is strain-induced. This is supported by the observed dependence of direction of K-u on the angle between applied magnetic field and crystallographic orientation of the underlying Si(100) substrate, and increase in the coercivity with the increase of the film thickness. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:3118 / 3121
页数:4
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