Formation of Boron-Based Films and Boron Nitride Layers by CVD of a Boron Ester

被引：13
作者：
Sachdev, Hermann
Mueller, Frank [1 ]
Huefner, Stefan [1 ]
机构：
[1] Univ Saarland, Nat Wissenschaft Tech Fak Phys & Mechatron 2, D-66041 Saarbrucken, Germany
来源：
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION | 2011年 / 50卷 / 16期
关键词：
boron; chemical vapor deposition; monolayers; nitrides; surface analysis; B-TRICHLOROBORAZINE (CLBNH)(3); HIGH-PRESSURE; MONOLAYER; CRYSTALS; NI(111); NANOMESH; GROWTH; STATES;
D O I：
10.1002/anie.201003012
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
(Figure Presented) Directing films: The chemical vapor deposition of (MeO)3B on a multilayered Rh(111) substrate results in selective precursor decomposition leading to a boride-type film. This film can be oxidized into a well-ordered boron nitride monolayer (see picture with model structure), thus opening up a new approach to BN systems. © 2011 Wiley-VCH Verlag GmbH & Co. KGaA.
引用
收藏
页码：3701 / 3705
页数：5
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