Infrared absorption analysis of organosilicon/oxygen plasmas in a microwave multipolar plasma excited by distributed electron cyclotron resonance

被引：1
|
作者：
Raynaud, P
Marlière, C
Berthomieux, D
Segui, Y
Durand, J
Burke, R
机构：
[1] Univ Toulouse 3, Lab Genie Elect, CNRS, ESA 5003, F-31062 Toulouse, France
[2] Univ Montpellier 2, ENSCM, UMR 9987, Lab Mat & Proc Membranaires, F-34053 Montpellier, France
[3] Univ Grenoble 1, LEMD, CNRS, UMR C5517, F-38042 Grenoble, France
来源：
JOURNAL DE PHYSIQUE IV | 1998年 / 8卷 / P7期
关键词：
D O I：
10.1051/jp4:1998722
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
The dissociation of 4 groups of organosilicon monomers (such as hexamethydisiloxane, tetraethoxysilane, tetramethylsilane or tetramethoxysilane) in a MMP DECR reactor is analyzed by infrared absorption spectroscopy. The parent molecules are totally dissociated above 100 watts. The daughter stable molecules, such as C2H2, CH4, CO2, CO, C2H4 and OCH2 have been detected at low power but are dissociated at higher power. Each group exhibits its very own characteristics of dissociation as well as production of new species depending an its chemical composition. It seems that the DECR plasma at high energy dissociates the monomer molecule into its constituent atoms.
引用
收藏
页码：265 / 272
页数：8
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