Modified particle detection method for reticle/mask particle detection system

被引：0

作者：

Nagai, Y ^{[1
]}

Kanzaki, T ^{[1
]}

机构：

[1] HORIBA Ltd, Minami Ku, Kyoto, Japan

来源：

PHOTOMASK AND X-RAY MASK TECHNOLOGY V | 1998年 / 3412卷

关键词：

false detection; misdetection; light scattering;

D O I：

10.1117/12.328840

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A false detect in light scattering particle detection system is mainly caused by scattering light from densely designed pattern. HORIBA has developed a new signal processing method for particle detection system in order to reduce false detect. This method reduce the scattering light signals from densely designed pattern in particular. This paper describes the method and the test result.

引用

页码：586 / 588

页数：3