On-line analysis of process chemicals by inductively coupled plasma mass spectrometry (ICP-MS)

被引：0

作者：

Kishi, Y ^{[1
]}

Kawabata, K ^{[1
]}

Palsulich, D ^{[1
]}

Wiederin, D ^{[1
]}

机构：

[1] PerkinElmer Life & Analyt Sci, Concord, ON L4K 4V8, Canada

来源：

CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY | 2003年 / 683卷

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

An initial study of on-line remote system for monitoring of trace metals using the inductively coupled plasma mass spectrometer equipped with dynamic reaction cell system is described. The three types of cleaning solutions (HF, SC-1 and SC-2) used in the traditional RCA clean procedure are analyzed periodically with one set of simple calibration curves to simulate the on-line monitoring. A remote sampling system for on-line monitoring with the combination of the ICP-MS is also demonstrated.

引用

页码：606 / 610

页数：5

共 9 条

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