A mask industry assessment: 2002

被引:0
作者
Kimmel, KR [1 ]
机构
[1] SEMATECH, Austin, TX 78741 USA
来源
19TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS | 2003年 / 5148卷
关键词
mask industry; photomask; industry; mask yield; photomask yield; mask quality; photomask quality;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Microelectronics industry leaders routinely name mask technology and mask supply issues of cost and cycle time as top issues of concern. A survey was created with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of member company mask technologists, merchant mask suppliers, and industry equipment makers. This assessment can be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of our critical mask industry. It should serve as a valuable reference to identify strengths and opportunities and to guide investments on critical-path issues. Questions are grouped into five categories: General Business Profile Information; Data Processing; Yields and Yield loss Mechanisms; Delivery Time; and Returns and Services. Within each category are a multitude of questions that create a detailed profile of both the business and technical status of the critical mask industry.
引用
收藏
页码:XV / XXVIII
页数:14
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