Anomalous turn-on voltage degradation during hot-carrier stress in polycrystalline silicon thin-film transistors

被引:69
|
作者
Farmakis, FV
Brini, J
Kamarinos, G
Dimitriadis, CA
机构
[1] ENSERG, LPCS, F-38016 Grenoble 1, France
[2] Univ Thessaloniki, Dept Phys, GR-54006 Salonika, Greece
关键词
excimer laser; hot carriers; thin-film transistor;
D O I
10.1109/55.902836
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this letter, we present experimental data showing that hot-carrier stress in laser annealed polycrystalline silicon thin-film transistors provokes an anomalous turn-on voltage variation, Although under various hot-carrier stress intensities the maximum transconductance degradation shows the same power-time dependent law, turn-on voltage can exhibit different behaviors. This observation lead to the conclusion that turn-on voltage depends on two different degradation mechanisms: injection of hot carriers into the gate oxide and degradation of grain boundaries. We show that these two mechanisms may be distinguished since they obey different power-time dependent laws as a function of stress duration.
引用
收藏
页码:74 / 76
页数:3
相关论文
共 50 条
  • [41] Device simulation of grain boundaries with oxide-silicon interface roughness in laser-crystallized polycrystalline silicon thin-film transistors
    Kimura, M
    Eguchi, T
    Inoue, S
    Shimoda, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2000, 39 (8A): : L775 - L778
  • [42] Grain and grain-boundary control of the transfer characteristics of large-grain polycrystalline silicon thin-film transistors
    Farmakis, FV
    Brini, J
    Kamarinos, G
    Angelis, CT
    Dimitriadis, CA
    Miyasaka, M
    Ouisse, T
    SOLID-STATE ELECTRONICS, 2000, 44 (06) : 913 - 916
  • [43] Impact of Nanosheet Thickness on Performance and Reliability of Polycrystalline-Silicon Thin-Film Transistors With Double-Gate Operation
    Ma, William Cheng-Yu
    Su, Chun-Jung
    Kao, Kuo-Hsing
    Guo, Jing-Qiang
    Wu, Cheng-Jun
    Wu, Po-Ying
    Hung, Jia-Yuan
    IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2023, 22 : 740 - 746
  • [44] Comparison of N2 and NH3 plasma passivation effects on polycrystalline silicon thin-film transistors
    Lee, YS
    Lin, HY
    Lei, TF
    Huang, TY
    Chang, TC
    Chang, CY
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1998, 37 (07): : 3900 - 3903
  • [45] THE FIELD-EFFECT MOBILITY AND THE CURRENT-VOLTAGE CHARACTERISTICS OF AMORPHOUS-SILICON THIN-FILM TRANSISTORS
    MIKI, H
    TOBITA, T
    NAKANISHI, T
    KARIYA, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (11A): : 2740 - 2741
  • [46] PHOSPHORUS DOPING USING ELECTRON-CYCLOTRON-RESONANCE PLASMA FOR LARGE-AREA POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS
    KAKINUMA, H
    MOHRI, M
    TSURUOKA, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (1B): : 654 - 658
  • [47] High-performance polycrystalline silicon thin-film transistors fabricated by high-temperature process with excimer laser annealing
    Jiroku, H
    Miyasaka, M
    Inoue, S
    Tsunekawa, Y
    Shimoda, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2004, 43 (6A): : 3293 - 3296
  • [48] Low-temperature-processed polycrystalline silicon thin-film transistors using a new two-step crystallization technique
    Fan, CL
    Chen, MC
    Chang, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (10): : 6335 - 6338
  • [49] Analysis of hot carrier effect in low-temperature poly-Si thin-film transistors towards high reliability
    Fuyuki, T
    Uraoka, Y
    POLYCRYSTALLINE SEMICONDUCTORS IV MATERIALS, TECHNOLOGIES AND LARGE AREA ELECTRONICS, 2001, 80-81 : 349 - 359
  • [50] Correlation between threshold voltage and the S-factor of polysilicon thin-film transistors and the changes due to bias stress
    Jang, YH
    Park, WS
    Chun, MD
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (08): : 5014 - 5015