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Anomalous turn-on voltage degradation during hot-carrier stress in polycrystalline silicon thin-film transistors
被引:69
|作者:
Farmakis, FV
Brini, J
Kamarinos, G
Dimitriadis, CA
机构:
[1] ENSERG, LPCS, F-38016 Grenoble 1, France
[2] Univ Thessaloniki, Dept Phys, GR-54006 Salonika, Greece
关键词:
excimer laser;
hot carriers;
thin-film transistor;
D O I:
10.1109/55.902836
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
In this letter, we present experimental data showing that hot-carrier stress in laser annealed polycrystalline silicon thin-film transistors provokes an anomalous turn-on voltage variation, Although under various hot-carrier stress intensities the maximum transconductance degradation shows the same power-time dependent law, turn-on voltage can exhibit different behaviors. This observation lead to the conclusion that turn-on voltage depends on two different degradation mechanisms: injection of hot carriers into the gate oxide and degradation of grain boundaries. We show that these two mechanisms may be distinguished since they obey different power-time dependent laws as a function of stress duration.
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页码:74 / 76
页数:3
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