Fabrication of carbon/silicon carbide composites by isothermal chemical vapor infiltration, using the in situ whisker-growing and matrix-filling process
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作者:
Oh, BJ
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Yonsei Univ, Dept Ceram Engn, Seoul 120749, South KoreaYonsei Univ, Dept Ceram Engn, Seoul 120749, South Korea
Oh, BJ
[1
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Lee, YJ
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机构:Yonsei Univ, Dept Ceram Engn, Seoul 120749, South Korea
Lee, YJ
Choi, DJ
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机构:Yonsei Univ, Dept Ceram Engn, Seoul 120749, South Korea
Choi, DJ
Hong, GW
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机构:Yonsei Univ, Dept Ceram Engn, Seoul 120749, South Korea
Hong, GW
Park, JY
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机构:Yonsei Univ, Dept Ceram Engn, Seoul 120749, South Korea
Park, JY
Kim, WJ
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机构:Yonsei Univ, Dept Ceram Engn, Seoul 120749, South Korea
Kim, WJ
机构:
[1] Yonsei Univ, Dept Ceram Engn, Seoul 120749, South Korea
[2] Korea Atom Energy Res Inst, Taejon, South Korea
C/SiC composites,were prepared via isothermal chemical vapor infiltration (ICVI), A novel process of ill situ whisker growing and matrix filling during ICVI was devised to reduce the porosity of the C/SiC composites, by alternating the dilute-gas species. C/SiC composites with increased density were prepared successfully using this novel process, in comparison with those obtained from the conventional ICVI process. The whiskers seem to have grown into the large pores and modified the pore structure that is filled by the SIC matrix.