Structure and mechanical properties of Cr-Zr-N films synthesized by closed field unbalanced magnetron sputtering with vertical magnetron sources

被引:71
作者
Kim, G
Kim, B
Lee, S
Hahn, J
机构
[1] HanKuk Aviat Univ, Ctr Adv Plasma Surface Technol, Kyonggi Do 412791, South Korea
[2] HanKuk Aviat Univ, Dept Mat Engn, Kyonggi Do 412791, South Korea
[3] Korea Res Inst Stand Sci, Div Chem Metrol & Mat Educ, Taejon 305600, South Korea
关键词
ternary nitride coating; Cr-Zr-N; hardness; wear property; CFUBMS;
D O I
10.1016/j.surfcoat.2005.08.101
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this work, ternary Cr1-xZrxN films with 0 <= x <= 0.34 were synthesized by closed field unbalanced magnetron sputtering (CFUBMS) with vertical magnetron sources and their crystalline structure, morphology and mechanical properties as a function of Zr content (x value) were characterized by X-ray difftaction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), nanoindentation and wear tests. The results reveal that the structure and mechanical properties of films were found to depend strongly on the Zr content. As the Zr content increases, the more dense and compact microstructure is developed and the surface roughness is greatly decreased. Also, the mechanical properties including hardness (maximum hardness: 34 GPa) and wear property are largely improved in comparison with CrN film. These enhancements on the mechanical properties of Cr1-xZrxN films could be attributed to the solid solution hardening. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:1669 / 1675
页数:7
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