Effects of bias on properties of Ti-C:H films coated by filtered cathodic vacuum arc

被引：4

作者：

Lee, S. ^{[2
]}

Chu, C-L ^{[1
]}

Gwo, J. ^{[2
]}

Huang, J-J ^{[2
]}

Tsai, M-J ^{[3
]}

Wang, S-M ^{[4
]}

机构：

[1] Natl Taiwan Univ, Dept Elect Engn, Taipei 10764, Taiwan

[2] Natl Cent Univ, Dept Mech Engn, Chungli 32054, Taiwan

[3] Inst Nucl Energy Res, Lungtan 32500, Taiwan

[4] DuPont Apollo, Prod R&D Dept, Hong Kong, Hong Kong, Peoples R China

来源：

SURFACE ENGINEERING | 2011年 / 27卷 / 07期

关键词：

Filtered cathodic vacuum arc; DLC; Metal containing carbon film; DIAMOND-LIKE CARBON; DLC FILMS; MECHANICAL-PROPERTIES; ION-IMPLANTATION; DEPOSITION; BEHAVIOR; STEEL;

D O I：

10.1179/1743294410Y.0000000012

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A bias voltage apparatus is attached to the filtered cathode vacuum arc system for coating a diamond-like film containing Ti on WC substrate. Ti, which acts as the cathode target, is sputtered by plasma, and reacts with C(2)H(2) gas, then deposits on the WC under working conditions of 60 A current and voltage between -50 and -275 V. Such processed diamond-like film containing Ti(Ti-C:H) is analysed by glow discharge spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy and nanoindentation for determining Ti concentration, crystallographic structure, bonding mode and mechanical properties. Characteristic parameters are determined to obtain suitable properties, and the underlying reasons are also addressed.

引用

页码：531 / 535

页数：5

共 20 条

[1] Preparation and properties of W-containing diamond-like carbon films by magnetron plasma source ion implantation [J].