High-Rate Deposition of Electrochromic Organotungsten Oxide Thin Films for Flexible Electrochromic Devices by Atmospheric Pressure Plasma Jet: The Effect of Substrate Distance

被引：9

作者：

Lin, Yung-Sen ^{[1
]}

Wu, Siang-Syuan ^{[1
]}

Tsai, Tsung-Hsien ^{[1
]}

机构：

[1] Feng Chia Univ, Dept Chem Engn, Taichung 407, Taiwan

来源：

PLASMA PROCESSES AND POLYMERS | 2011年 / 8卷 / 08期

关键词：

atmospheric plasmas; electrochromism; PECVD; plasma jets; tungsten oxide; CHEMICAL-VAPOR-DEPOSITION; GLOW-DISCHARGE CVD; LOW-TEMPERATURE; WO3; ALUMINUM; BEHAVIOR;

D O I：

10.1002/ppap.201000116

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

High-rate deposition of electrochromic organotungsten oxide (WO(x)C(y)) films onto flexible PET (polyethylene terephthalate)/ITO (indium tin oxide) substrates by atmospheric pressure-plasma enhanced chemical vapor deposition (AP-PECVD) with atmospheric pressure plasma jet (APPJ) under various substrate distances is investigated. A precursor (tungsten carbonyl, W(CO)(6), TC) vapor, carried by argon gas, is injected into air plasma torch for the synthesis of WO(x)C(y) films. Uniform light modulation up to 1 cm wide on PET/ITO/WO(x)C(y) is produced, while the moving PET/ITO substrate is exposed to a 0.3 cm diameter plasma torch at room temperature (approximate to 23 degrees C) and atmospheric pressure. The porous APPJ-synthesized WO(x)C(y) films result in fast responses using potential steps for coloration of 11.5 s at -1V and bleaching of 7.2 s at +1V, respectively. APPJ-synthesized WO(x)C(y) films offer noteworthy electrochromic performance in light modulation with up to 73.0% of transmittance variation, optical density change of 0.72 and coloration efficiency of 67.7 cm(2).C(-1) at a wavelength of 800 nm.

引用

页码：728 / 739

页数：12

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