Applications of aluminum nitride (AlN) ceramics

被引：13

作者：

Kuramoto, N ^{[1
]}

Takada, K ^{[1
]}

机构：

[1] Tokuyama Corp, Shibuya Ku, Tokyo 1508383, Japan

来源：

ADVANCED CERAMICS AND COMPOSITES | 2003年 / 247卷

关键词：

AlN; aluminum nitride; application;

D O I：

10.4028/www.scientific.net/KEM.247.467

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Tokuyama Corp. developed a new AlN powder with very high purity as well as translucent AlN ceramics in 1982. Since then, various manufacturing methods and metallization techniques have been developed so as to open up a new market for this innovative material. Its high thermal conductivity and well-balanced properties make AlN ceramics the customers' choice in a wide range of application. AlN ceramics are particularly useful in the areas where thermal management is a key to improve the performance of semiconductors, e.g. GTO thyristor, IGBT, microprocessor and laser diode. This paper provides information on the characteristics of AlN ceramics and its manufacturing processes. Also, some specific examples of applications are presented.

引用

页码：467 / 472

页数：6