Spectroscopic investigations of pulsed microwave generated Ar, N2 and silane plasmas

被引:5
|
作者
Krüger, J [1 ]
Kubach, T [1 ]
Feichtinger, J [1 ]
Hirsch, K [1 ]
Lindner, P [1 ]
Quell, S [1 ]
Schulz, A [1 ]
Stirn, R [1 ]
Walker, M [1 ]
Schumacher, U [1 ]
机构
[1] Univ Stuttgart, Inst Plasmaforsch, D-70569 Stuttgart, Germany
来源
SURFACE & COATINGS TECHNOLOGY | 2003年 / 174卷
关键词
pulsed microwave plasma; silicon; argon; nitrogen; optical spectroscopy; Langmuir probe;
D O I
10.1016/S0257-8972(03)00446-8
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The Plasmodul (Proc. ISPC 15, Orleans, V (2001) 1853), an array of four parallel coaxial microwave guides is used as source for (square wave) pulsed plasmas in argon, nitrogen and silane at pressures of 5-50 Pa. The plasma is homogeneously extended over an area of 12 by 12 cm(2). The temporal and radial behaviour of the electron temperature T-e(r, t), the electron density n(e)(r, t) and the densities of several molecules, atoms and ions are investigated with different diagnostic tools. The data are compared and discussed for the three different plasma gases. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:933 / 937
页数:5
相关论文
共 50 条
  • [21] Linear and centrosymmetric N2•••Ar+•••N2
    Linnartz, H
    Verdes, D
    Knowles, PJ
    Lakin, NM
    Rosmus, P
    Maier, JP
    JOURNAL OF CHEMICAL PHYSICS, 2000, 113 (03): : 895 - 898
  • [22] Temperature of Particulates in Low-Pressure rf-Plasmas in Ar, Ar/H2 and Ar/N2 Mixtures
    Maurer, H. R.
    Basner, R.
    Kersten, H.
    CONTRIBUTIONS TO PLASMA PHYSICS, 2010, 50 (10) : 954 - 961
  • [23] Emission spectrum diagnostics for nitrogen plasmas generated by pulsed microwave discharge
    Qiu, Feng
    Yan, Eryan
    Meng, Fanbao
    Liu, Minghai
    Ma, Hongge
    Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams, 2014, 26 (02):
  • [24] Investigation of the electron energy distributions in Ar/N2 ECR plasmas with magnetic mirror
    Muta, H
    Thang, DH
    Kawai, Y
    VACUUM, 2004, 74 (3-4) : 373 - 377
  • [25] Effects of N2 addition on chemical dry etching of silicon oxide layers in F2/N2/Ar remote plasmas
    Hwang, J. Y.
    Kim, D. J.
    Lee, N. -E.
    Jang, Y. C.
    Bae, G. H.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2006, 24 (04): : 1380 - 1385
  • [26] Microwave N2-Ar plasmas applied for N-graphene post synthesis
    Bundaleska, N.
    Bundaleski, N.
    Dias, A.
    Dias, F. M.
    Abrashev, M.
    Filipic, G.
    Cvelbar, U.
    Rakocevic, Z.
    Kissovski, Zh
    Henriques, J.
    Tatarova, E.
    MATERIALS RESEARCH EXPRESS, 2018, 5 (09):
  • [27] Spectroscopic diagnostics of pulsed microwave plasmas used for nanocrystalline diamond growth
    Benedic, Fabien
    Duten, Xavier
    Syll, Ousmane
    Lombardi, Guillaume
    Hassouni, Khaled
    Gicquel, Alix
    CHEMICAL VAPOR DEPOSITION, 2008, 14 (7-8) : 173 - 180
  • [28] Optical emission spectroscopy and imaging of low-pressure N2 plasmas generated by intense fast-pulsed electron beams
    Kaiser, E. R.
    Jackson, S. L.
    Swanekamp, S. B.
    Hinshelwood, D. D.
    Isner, N. D.
    Richardson, A. S.
    PHYSICS OF PLASMAS, 2025, 32 (02)
  • [29] LASER SPECTROSCOPIC ANALYSIS OF N2 PULSED DISCHARGES AT LOW-TEMPERATURES
    SCAFFARDI, L
    SCHINCA, D
    ALMANDOS, JR
    GALLARDO, M
    GARAVAGLIA, M
    APPLIED OPTICS, 1980, 19 (21): : 3590 - 3592
  • [30] Reactive oxygen and nitrogen species in Ar + N2 thorn O2 atmospheric-pressure nanosecond pulsed plasmas in contact with liquid
    Liang, Jianping
    Zhou, Xiongfeng
    Zhao, Zilu
    Wang, Wenchun
    Yang, Dezheng
    Yuan, Hao
    PHYSICS OF PLASMAS, 2019, 26 (02)