Improvement of amorphous silicon n-i-p solar cells by incorporating double-layer hydrogenated nanocrystalline silicon structure

被引:38
作者
Liu, Shiyong [1 ]
Zeng, Xiangbo [1 ]
Peng, Wenbo [1 ]
Xiao, Haibo [1 ]
Yao, Wenjie [1 ]
Xie, Xiaobing [1 ]
Wang, Chao [1 ]
Wang, Zhanguo [1 ]
机构
[1] Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
关键词
Hydrogenated nanocrystalline silicon; Buffer layer; i/p interface; Solar cells; OPEN-CIRCUIT VOLTAGE; A-SI-H; P/I-INTERFACE; MICROCRYSTALLINE SILICON; VAPOR-DEPOSITION; FILMS; CAPACITANCE; EFFICIENCY; CRYSTALLINE; TEMPERATURE;
D O I
10.1016/j.jnoncrysol.2010.10.001
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We develop a double-layer p-type hydrogenated nanocrystalline silicon (p-nc-Si:H) structure consisting of a low hydrogen diluted i/p buffer layer and a high hydrogen diluted p-layer to improve the hydrogenated amorphous silicon (a-Si:H) n-i-p solar cells. The electrical, optical and structural properties of p-nc-Si:H films with different hydrogen dilution ratio (R(H)) are investigated. High conductivity, low activation energy and wide band gap are achieved for the thin films. Raman spectroscopy and high-resolution transmission electron microscopy (HRTEM) analyses indicate that the thin films contain nanocrystallites with grain size around 3-5 nm embedded in the amorphous silicon matrix. By inserting a p-nc-Si:H buffer layer at the i/p interface, the overall performance of the solar cell is improved significantly compared to the bufferless cell. The improvement is correlated with the reduction of the density of defect states at the i/p interface. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:121 / 125
页数:5
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